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SEMI MF847 : 2016

SEMI MF847 : 2016

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Current

The latest, up-to-date edition.

TEST METHOD FOR MEASURING CRYSTALLOGRAPHIC ORIENTATION OF FLATS ON SINGLE CRYSTAL SILICON WAFERS BY X-RAY TECHNIQUES

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Describes the determination of [alfa], the angular deviation between the crystallographic orientation of the direction perpendicular to the plane of a fiducial flat on a circular silicon wafer, and the specified orientation of the flat in the plane of the wafer surface.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (02/2005)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

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