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SEMI M55 : 2017

SEMI M55 : 2017

Current

Current

The latest, up-to-date edition.

SPECIFICATION FOR POLISHED MONOCRYSTALLINE SILICON CARBIDE WAFERS

Published date

01-12-2013

Publisher

Semiconductor Equipment & Materials Institute

Contains substrate requirements for monocrystalline high-purity silicon carbide wafers of crystallographic polytype 6H and 4H used in semiconductor and electronic device manufacturing.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (02/2003) Includes: SEMI M55.1, SEMI M55.3 & SEMI M55.4. Supersedes SEMI M55.2. (09/2014)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current
Supersedes

SEMI M81 : 2018 GUIDE TO DEFECTS FOUND IN MONOCRYSTALLINE SILICON CARBIDE SUBSTRATES
SEMI M87 : 2016 TEST METHOD FOR CONTACTLESS RESISTIVITY MEASUREMENT OF SEMI-INSULATING SEMICONDUCTORS

SEMI MF533 : 2010(R2016) TEST METHODS FOR THICKNESS AND THICKNESS VARIATION OF SILICON WAFERS
SEMI M59 : 2014 TERMINOLOGY FOR SILICON TECHNOLOGY
SEMI MF928 : 2017 TEST METHOD FOR EDGE CONTOUR OF CIRCULAR SEMICONDUCTOR WAFERS AND RIGID DISK SUBSTRATES
SEMI MF1530 : 2007(R2018) TEST METHOD FOR MEASURING FLATNESS, THICKNESS, AND TOTAL THICKNESS VARIATION ON SILICON WAFERS BY AUTOMATED NON-CONTACT SCANNING
SEMI M83 : 2013 TEST METHOD FOR DETERMINATION OF DISLOCATION ETCH PIT DENSITY IN MONOCRYSTALS OF 3-5 COMPOUND SEMICONDUCTORS
SEMI MF2074 : 2012 (R2018) GUIDE FOR MEASURING DIAMETER OF SILICON AND OTHER SEMICONDUCTOR WAFERS
SEMI T5 : 2014 SPECIFICATION FOR ALPHANUMERIC MARKING OF ROUND COMPOUND SEMICONDUCTOR WAFERS
SEMI MF673 : 2017 TEST METHOD FOR MEASURING RESISTIVITY OF SEMICONDUCTOR WAFERS OR SHEET RESISTANCE OF SEMICONDUCTOR FILMS WITH A NONCONTACT EDDY-CURRENT GAUGE
SEMI M87 : 2016 TEST METHOD FOR CONTACTLESS RESISTIVITY MEASUREMENT OF SEMI-INSULATING SEMICONDUCTORS
SEMI MF154 : 2005(R2016) GUIDE FOR IDENTIFICATION OF STRUCTURES AND CONTAMINANTS SEEN ON SPECULAR SILICON SURFACES
SEMI MF523 : 2007(R2018) PRACTICE FOR UNAIDED VISUAL INSPECTION OF POLISHED SILICON WAFER SURFACES
SEMI MF847 : 2016 TEST METHOD FOR MEASURING CRYSTALLOGRAPHIC ORIENTATION OF FLATS ON SINGLE CRYSTAL SILICON WAFERS BY X-RAY TECHNIQUES
SEMI MF671:2012 TEST METHOD FOR MEASURING FLAT LENGTH ON WAFERS OF SILICON AND OTHER ELECTRONIC MATERIALS

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