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SEMI MF1239 : 2005(R2016)

SEMI MF1239 : 2005(R2016)

Current

Current

The latest, up-to-date edition.

TEST METHOD FOR OXYGEN PRECIPITATION CHARACTERISTICS OF SILICON WAFERS BY MEASUREMENT OF INTERSTITIAL OXYGEN REDUCTION

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Intended to be used to compare the oxygen reduction of two or more groups of silicon wafers. Also may be used to compare qualitatively the precipitation characteristics of two or more groups of wafers.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (11/2003)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

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