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SEMI MF674 : 2016

SEMI MF674 : 2016

Current

Current

The latest, up-to-date edition.

PRACTICE FOR PREPARING SILICON FOR SPREADING RESISTANCE MEASUREMENTS

Published date

12-01-2013

Publisher

Semiconductor Equipment & Materials Institute

Contains the surface preparation of silicon samples using diamond polishing prior to measurement of resistivity variations by the spreading resistance technique.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (02/2005)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

BS ISO 14237:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials
SEMI MF672 : 2007 TEST METHOD FOR MEASURING RESISTIVITY PROFILES PERPENDICULAR TO THE SURFACE OF A SILICON WAFER USING A SPREADING RESISTANCE PROBE
ISO 14237:2010 Surface chemical analysis Secondary-ion mass spectrometry Determination of boron atomic concentration in silicon using uniformly doped materials

SEMI M59 : 2014 TERMINOLOGY FOR SILICON TECHNOLOGY

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